[1]王森林,洪亮亮.关于XRD计算镀层织构公式的辨析[J].华侨大学学报(自然科学版),2008,29(3):476-478.[doi:10.11830/ISSN.1000-5013.2008.03.0476]
 WANG Shen-lin,HONG Liang-liang.The Differentiation About the Formulae of Texture of Electroplating Deposit by Using XRD[J].Journal of Huaqiao University(Natural Science),2008,29(3):476-478.[doi:10.11830/ISSN.1000-5013.2008.03.0476]
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关于XRD计算镀层织构公式的辨析()
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《华侨大学学报(自然科学版)》[ISSN:1000-5013/CN:35-1079/N]

卷:
第29卷
期数:
2008年第3期
页码:
476-478
栏目:
出版日期:
2008-07-20

文章信息/Info

Title:
The Differentiation About the Formulae of Texture of Electroplating Deposit by Using XRD
文章编号:
1000-5013(2008)03-0476-03
作者:
王森林洪亮亮
华侨大学材料科学与工程学院; 华侨大学材料科学与工程学院 福建泉州362021; 福建泉州362021
Author(s):
WANG Shen-lin HONG Liang-liang
College of Material Science and Engineering, Huaqiao University, Quanzhou 362021, China
关键词:
织构公式 择优取向 X射线衍射 镀层
Keywords:
texture formula preferred orientation X-ray diffraction electroplating deposit
分类号:
TG174.4
DOI:
10.11830/ISSN.1000-5013.2008.03.0476
文献标志码:
A
摘要:
通过分析电沉积金属镀层的织构,探讨3种常见的织构公式的应用.分析表明,织构式Mhkl=[ΣIIhhk′lk′l′]/[ΣII0hh0′kkl′l′]采用峰加和的办法是其无法解决的缺陷,因此不宜采用; 而式TC=[II0hhkkll]/[(1n)Σ(II0hhkkll)]在研究单相镀层织构不但可以研究织构变化趋势,还可以半定量地估算镀层是否实现择优; 而计算多相物质的织构采用织构式p=RR0,R=II((θθ12))则较为简便.最后,通过实例进行验证.
Abstract:
In this paper,author analyzes the texture of the electroplating metallic deposit,and then distinguishes three texture formulae in several correlate papers.It found that,the formula of Mhkl=[IhklΣIh′k′l′]/[I0hklΣI0h′k′l′] is not suitable for calculating the texture of materials by summation of the intensity of all peaks; the formula of TC=[IhklI0hkl]/[(1n)Σ(IhklI0hkl)] has some advantages,such as,calculating the change trend of the texture of materials in single-phase,and estimating the preferred orientation of the plating deposit in half quantification; p=RR0,R=I(θ1)I(θ2) is more convenience for studying multi-phase materials.In the end,the formulae have been tested experimentally.

参考文献/References:

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备注/Memo

备注/Memo:
福建省自然科学基金资助项目(E0210020)
更新日期/Last Update: 2014-03-23