[1]郭必成,张丽彬,张涛,等.碱溶性光敏树脂保护层的产生与消除方法[J].华侨大学学报(自然科学版),2017,38(4):441-445.[doi:10.11830/ISSN.1000-5013.201704001]
 GUO Bicheng,ZHANG Libin,ZHANG Tao,et al.Generation and Elimination Method of Shield Layer Made by Alkali Soluble Photosensitive Resin[J].Journal of Huaqiao University(Natural Science),2017,38(4):441-445.[doi:10.11830/ISSN.1000-5013.201704001]
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碱溶性光敏树脂保护层的产生与消除方法()
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《华侨大学学报(自然科学版)》[ISSN:1000-5013/CN:35-1079/N]

卷:
第38卷
期数:
2017年第4期
页码:
441-445
栏目:
出版日期:
2017-07-10

文章信息/Info

Title:
Generation and Elimination Method of Shield Layer Made by Alkali Soluble Photosensitive Resin
文章编号:
1000-5013(2017)04-0441-05
作者:
郭必成1 张丽彬1 张涛1 姜峰1 言兰2
1. 华侨大学 制造工程研究院, 福建 厦门 361021;2. 华侨大学 机电及自动化学院, 福建 厦门 361021
Author(s):
GUO Bicheng1 ZHANG Libin1 ZHANG Tao1 JIANG Feng1 YAN Lan2
1. Institute of Manufacturing Engineering, Huaqiao University, Xiamen 361021, China; 2. College of Mechanical Engineering and Automation, Huaqiao University, Xiamen 361021, China
关键词:
屏蔽层 碱溶性光敏树脂 分段电镀 紫外线 固化率
Keywords:
shield layer alkali soluble photosensitive resin thickness range ultraviolet curing degree
分类号:
TG1
DOI:
10.11830/ISSN.1000-5013.201704001
文献标志码:
A
摘要:
提出一种手机磨头电镀过程中非电镀位置碱溶性光敏树脂保护层的产生与消除的方法.首先,用毛刷在工件上涂一层厚度为194~366 μm的碱溶性光敏树脂;其次,在80 ℃电阻炉内表面干燥40 min,然后,在工件需要保护的部分用紫外线照射固化50 s,工件需要电镀的部分无需照射,用质量分数为3%的Na2CO3溶液冲洗工件5 min,未被照射的部分树脂被去除,固化率为99.48%.最后,用质量分数为10%的NaOH溶液把保护层全部去除.结果表明:这种保护层产生及去除的方法成本低、效率高、环保,具有很好的发展前景.
Abstract:
A new method of the generation and elimination of protective layer has been proposed in this study. Firstly, the workpiece was brushed with a layer of alkali soluble photosensitive resin, with thickness range from 194 to 366 μm. Secondly, the workpiece was dried in the resistance furnace, with temperature of 80 ℃ and drying time of 40 min. Then the ultraviolet was used to cure the part of the workpiece which needed protection 50 s, and the part which needed to be plated avoid irradiating. The workpiece was rinsed by the Na2CO3 solution with mass fraction of 3% for 5 min, and the part not irradiated was removed. The curing degree was calculated as 99.48%. Finally, the protective layer was completely removed by the NaOH solution with mass fraction of 10%. The results showed that the method of the generation and elimination of protective layer is characterized by low cost, high efficiency and environmental protection.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期: 2016-12-04
通信作者: 姜峰(1981-),男,副教授,博士,主要从事精密加工过程的材料去除机理和工艺的研究.E-mail:jiangfeng@hqu.edu.cn.
基金项目: 福建省高校杰出科研人才培育计划项目(JA14013); 华侨大学科研启动基金资助项目(13Y0385, 13Y0386); 华侨大学高层次人才科研启动项目(1611303007)
更新日期/Last Update: 2017-07-20