[1]郭震宁.nc-Si/SiO2复合膜的非线性光学性质[J].华侨大学学报(自然科学版),2007,28(3):243-245.[doi:10.3969/j.issn.1000-5013.2007.03.006]
　GUO Zhen-ning.Nonlinear Optical Properties of nc-Si/SiO2 Thin Film[J].Journal of Huaqiao University(Natural Science),2007,28(3):243-245.[doi:10.3969/j.issn.1000-5013.2007.03.006]
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nc-Si/SiO2复合膜的非线性光学性质()
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《华侨大学学报（自然科学版）》[ISSN:1000-5013/CN:35-1079/N]

卷:
第28卷
期数:
2007年第3期
页码:
243-245
栏目:
出版日期:
2007-07-20

文章信息/Info

Title:
Nonlinear Optical Properties of nc-Si/SiO2 Thin Film
文章编号:
1000-5013(2007)03-0243-03
作者:
郭震宁
华侨大学信息科学与工程学院 福建泉州362021
Author(s):
GUO Zhen-ning
College of Information Science and Engineering, Huaqiao University, Quanzhou 362021, China
关键词:
nc-Si/SiO2复合膜;  简并四波混频;  光学非线性;  三阶极化率
Keywords:
nc-Si/SiO2 thin film;  degenerate four-wave mixing;  optical nonlinearity;  third-order susceptibility
分类号:
O484.41
DOI:
10.3969/j.issn.1000-5013.2007.03.006
文献标志码:
A
摘要:
采用等离子体增强化学气相淀积(PECVD)技术,制备a-SiOx∶H(0
Abstract:
Silicon nanocrystals embedded in SiO2 glassy thin film was prepared by plasma enhanced chemical vapor deposit(PECVD) technique and post-annealing treatment.The nonlinear optical properties of nanocrystalline silicon nc-Si/SiO2 thin film were investigated using degenerate four-wave mixing(DFWM).The phase conjugation signal was observed,and the third-order nonlinear susceptibility at 589 nm of the sample was measured X(3)=5.6×10-6 esu.The nonlinear mechanism of the material was analyzed.

参考文献/References:

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备注/Memo

备注/Memo:
福建省自然科学基金资助项目(E0410018); 国务院侨办科研基金资助项目(06QZR02)
更新日期/Last Update: 2014-03-23